iXsenic: a resource-efficient technology

Since iXsenic is coated under ambient conditions, meaning room temperature and atmospheric pressure, no vacuum is needed. Additionally, our product enables low annealing temperatures ≤ 350°C. All in all, this results in
energy savings up to 70 %
compared to vapor deposition.
In the production process iXsenic is only coated onto the substrate and the coated layer is very thin. This results in
material savings up to 80 %
compared to vapor deposition where the processing chamber gets partly or even completely covered with material during production and applied layers are thicker.